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Importance Of Spectroscopic Reflectometry

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By Author: Jacob Jhon
Total Articles: 5
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Ellipsometry is a technique used in the investigation of complex refractive index or dielectric function properties of thin films. Classification of optical constants and thickness of organic thin film is the primary method of determining these quantities. Spectroscopic ellipsometry and spectroscopic reflectometry are optical techniques that are flexible and are used to determine the optical and physical properties of a wide variety of thin-film materials such as silicon oxide, silicon, nitride and, even metal films.

In spectroscopic reflectometry reflected light intensities are measured with a broadband wavelength range. Non-polarized light is used at normal incidence. The main advantage of spectroscopic reflectometry is its low-cost and simplicity. Spectroscopic Ellipsometry is the measurement of the state of polarization before and after reflection to determine the properties of reflecting boundaries. This is an integral part of the metrology system and has its application in the semiconductor industry.

Measuring film thickness can be done using different instruments. One such way is with the SRM300 film thickness ...
... gauge. Film thickness or coating is an essential variable in process control, product quality and cost control. SRM300 is one of the most efficient thin film thickness measurement techniques that you can find in the market these days. Not only, the film thickness you will be able to know the refractive index up to five layers thick with a single mouse click. If you're worried on how hard, it will be for you to understand the software, don't worry it has a simple setup and is easy to operate.


The first step in this whole process is to understand the equipment used for film thickness measurement and its functionality for every coating operation. The SRM300 uses a window based software that most people are familiar with. The array based detector system guarantees the fastest film thickness measurement. The wavelength range varies from 400 to 1050nm.


Microspectrometry is designed to measure the spectrum of microscopic areas and is used to distinguish optical properties of a thin lens. They are configured to measure the absorbance, transmittance, reflectance, polarization and fluorescence of sample areas as small as a micron. Don't get confused microspectrometry is also known as microreflectometer, micro-reflectometer, microspectrometer, microphotometer (Spectroscopic), microspectroscopic photometer. With its unique design, the user can enjoy digital imaging capability by live video, powerful digital editing and lots of others features. It also covers deep-ultraviolet (DUV) to near-infrared ranges. Thickness ranges depend on several factors like wavelength range of interest for reflectance or transmittance and so on.


Angstrom Sun Technologies Inc. provides you with low cost but advanced tools like spectroscopic reflectometry, microreflectometer, film thickness mapping system and many more similar options. We also deliver analytical services for thin films, coatings and complicated layer stacks.

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